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Total 7 |
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7
Foundry - Etc
7
SEMITECH
|
09-03
|
View
13456
●Wet Station ■ Wet Bath & Spin Dryer ■ Dry Oven • Range Amb . +10 to 250 ℃ • Heating Time to 100 ℃ -> 9min • Recovery time at 100 ℃ -> 2min ● Inspection & Measurement ■ RS Measurement ■ Sheet Resistance ● …
6
Foundry - Deposition
6
SEMITECH
|
09-03
|
View
13394
● 협력사 보유 • LP-CVD / PE-CVD : A-Silicon / Silicon Nitride Film • Plasma Deposition : Dielectric Film (SiO2, Si3N4…) • Evaporator • Metallization System : Al, Au, Ti, Cr, Pt, Ni, CrN , TiO2
5
Foundry - Etch
5
SEMITECH
|
09-03
|
View
13094
● Dry Etch ■ICP-Etch • Full Automation • 7 Slot Cassette • Wafer Size 2”~12” • High Capacity for GaN & Sapphire Etching ● 협력사 보유 • Dry Etcher : Nitride, Oxide, Poly-Si, Metal Etching • Deep Reactive Dry Etcher : Vertical Silicon …
4
Foundry - Photolithography(150mm/6")
4
SEMITECH
|
09-03
|
View
13262
● Photolithography(150mm/6”) ■ Photo Stepper-1 • Single Side Alignment • Full Automation • G-Line / I-Line • Resolution (0.5 ㎛ ) ■ PR Track • HMDS Coating • PR Coating & Develop • Soft &…
3
Foundry - Diffusion
3
SEMITECH
|
08-28
|
View
13410
■ Anneal(150MM/6") ◆ RTA(AST-2800) - Process Temp Range 400 ~ 1,200 ℃ - Annealing & Thermal Oxidation - Cassette TYPE ◆ Furnaces : Thermal Oxidation/Impurity Diffusion/Annealing/Metal Alloying
2
Foundry - IMPLANT(150mm/6")
2
SEMITECH
|
08-28
|
View
13555
■ IMPLANT(150mm/6") MC IMP, E220HP MC IMP, E220HP Parameter E220HP E-1000 Species B, BF 2, P, (As), Ar , N B, BF 2 , P, (As), Ar , N Energy 10~200KeV Decel / Drift Double Charged Ions 10~200keV Decel / Drift Dos…
1
Foundry Service
1
SEMITECH
|
08-28
|
View
13705
1) 생산설비 · Implant : High Current(E-1000) / Medium Current(E220HP) · Photolithograph : Stepper(G-Line, I-Line) / PR Track · Etch : Dry Etch / Wet Etch · Deposition : RTA 2) 생산시설 · Clean Room : Class 1,000 / 420 ㎡ · Utility : PN2, GN2, CDA, PCW, P…
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801 Yatap LeadersB/D, 42, Jangmi-ro, Bundang-gu, Seongnam-si, Gyeonggi-do, Korea (13496)
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SEMITECH
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